Without this Chinese, there is no ASML, and there is no TSMC

EUV light carved machine, such as the throat, makes our semiconductor manufacturing very uncomfortable. Gathering high -end technologies in the West and using hundreds of thousands of parts to form an EUV lithography machine can be a peak technology of semiconductor manufacturing and the cradle of high -end process chips. This has led to in the fields of high -end smartphones, super computing and other fields. If we do not have an EUV lithography machine, it will be difficult to progress.

Lin Benjian, creating a technology that changes the structure of the optical carvings

EUV light carving machine, only one in the world can produce, that is ASML. However, in the history of the development of the light carved machine, ASML is not always leading. At the earliest, it was pressed by Japan's Nikon and Canon to rub on the ground.

It was not until ASML began to use immersion photobladed technology that it slowly achieved the overtake, and finally established the status of the king of the photoc.

What many people don't know is that this "immersion light -engraving technology" that helps ASML reached the summit is actually created by the Chinese. This Chinese name is Lin Benjian, who has worked in IBM for 20 years, and is a Da La in the semiconductor industry. In 2000, he joined TSMC. Two years later, he developed "infiltration micro -shadow technology".

It is this technology that broke the situation of the monopoly market of the dry light engraved machine and completely rewritten the pattern of the optical carvings industry.

Nikon's panic

At a chip seminar in 2002, Lin Benjian was invited to explain to the stage. That day, he proposed that water as an infiltrated liquid can help the light source wavelength from the light source from 193nm to 132nm. You know, at that time, Nikon and Canon were troubled by 157nm, but Lin Benjian directly told them that they could skip 157nm directly, and to a more advanced generation, I can imagine how shock they are.

But after being shocked, what Nikon thought was not embracing new technologies, but "exclusion". Because the heritage of the Nikon at that time came from the dry light machine. If they started from the infiltration type, it was equivalent to abandoning the industrial advantages established for a long time and the heavy money invested in dry photoblast technology. Obviously, the Nikon of the Nikon did not have such courage.

Although the new technologies panic Nikon, the later ASML and TSMC took the first step. In 2003, TSMC and ASML collaborated, and the world's first invasive light -engraved machine was born. Soon, the infiltrated light machine hangs the dry light carved machine with its own advantages.

The panic of the Nikon finally became a real failure. With the beginning of the industry's advantages, ASML finally created the EUV lithography machine, and the advantage became a victory.

TSMC's lead

Because of the earliest opportunities to seize the infiltration light -engraving technology, TSMC also started from 55nm and continuously advanced the progress of Moore's law to 7 generations, until today's 5nm, 3nm. Without Lin Benjian, TSMC could not become the boss of the wafer foundry, and ASML would not be an exclusive endorsement company for the EUV lithography machine.

In 2015, Lin Benjian retired from TSMC. Zhang Zhongmou said with a lot of emotions, and said to Lin Benjian at the party: Without you (Lin Benjian), TSMC's micro -shadow (light carved technology) will not have such a level today.

Semiconductor industry, the power of Chinese people

In addition to Lin Benjian, the Chinese in the semiconductor industry actually supported the half of the sky. For example, Professor Hu Zhengming, the University of California, Berkeley, and founder of the FinFETCH process, broke through the chip 20nm process; Zhang Zhongmou, who was once worked in Texas instruments, later created TSMC, Nvidia Huang Renxun, AMD Su Zifeng and so on.

The power of Yanhuang's descendants has never been inferior to anyone. The Chinese have proven that we have enough intelligence to stir the wind in the semiconductor industry. I believe that in the future, we will be able to break through the restrictions of the EUV lithography machine and truly realize chip autonomy.

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